Anode for magnetic sputtering

Details Anode for magnetic sputtering Anode for magnetic sputtering

C - Chemistry, Metallurgy

23

C

204/185, 204/167

C23C 14/35 (2006.01) C23C 14/56 (2006.01)

Patent

CA 1277955

Abstract of the Disclosure An improved anode system for producing coatings by magnetic sputtering is disclosed, comprising a metal mesh anode structure of expanded metal. It is particularly applicable to an elongated rectangular cathode of the type typically used in a scanning magnetron sputtering coating apparatus. A magnetic field forms a magnetic flux tunnel for the sputtered material over a closed loop region of the sputtering surface. The metal mesh anode is spaced from the major dimension of the tunnel. The mesh design allows free flow of the reactive atmosphere in the sputtering chamber and the anode can be oriented perpendicularly to the sputtering surface.

493547

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