Anode for magnetic sputtering of gradient films

Details Anode for magnetic sputtering of gradient films Anode for magnetic sputtering of gradient films

C - Chemistry, Metallurgy

23

C

204/167.2

C23C 14/35 (2006.01)

Patent

CA 1267865

Abstract of the Disclosure An improved anode-system for producing uniform gradient coatings by magnetic sputtering is disclosed, comprising a pair of anode plates asymmetrically designed and positioned along the length of the cathode. The magnetic flux lines form a tunnel in a closed loop on the sputtering surface. The glow discharge is confined by the magnetic field to the region adjacent the sputtering surface.

493096

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