Anodizing apparatus and apparatus and method associated with...

C - Chemistry – Metallurgy – 25 – D

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C25D 17/06 (2006.01) C25D 11/32 (2006.01) C25D 17/00 (2006.01) H01L 21/00 (2006.01) H01L 21/316 (2006.01) H01L 21/683 (2006.01)

Patent

CA 2222343

A holder (102) made from an HF-resistant material includes annular suction pads (105, 108). The suction pad (105) is used to hold a small silicon substrate by suction, and the suction pad (108) is used to hold a large silicon substrate by suction. This makes silicon substrates with various sizes processable. A silicon substrate is held by suction by reducing a pressure in a space in a groove of the suction pad by a pump (120). An opening (103) is formed in the holder (102) so that the both surfaces of the silicon substrate are brought into contact with an HF solution (115). The silicon substrate is anodized by applying a DC voltage by using a platinum electrode (109a) as a negative electrode and a platinum electrode (109b) as a positive electrode, and thereby a substrate having a porous layer is produced.

Dispositif de soutien (102) constitué d'un matériau résistant à l'acide fluorhydrique et muni de ventouses annulaires (105, 108). La ventouse (105) permet de soutenir par succion un substrat de silicium de petite taille, tandis que la ventouse (108) est conçue pour soutenir un substrat de silicium de grande taille. Cela permet de traiter des substrats de silicium de diverses tailles. Pour soutenir ainsi par succion un substrat de silicium, on réduit au moyen d'une pompe (120) la pression de l'espace formé par une rainure de la ventouse. Ce dispositif de soutien (102) comporte également une ouverture (103) pour permettre aux deux surfaces du substrat de silicium d'être mises en contact avec une solution d'acide fluorhydrique (115). On applique une tension en courant c.c. à ce substrat de silicium pour l'anodiser en utilisant une électrode en platine (109a) comme cathode et une électrode en platine (109b) comme anode; on produit ainsi un substrat à couche poreuse.

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