C - Chemistry – Metallurgy – 11 – D
Patent
C - Chemistry, Metallurgy
11
D
C11D 3/37 (2006.01) C03C 23/00 (2006.01) C11D 3/02 (2006.01) C11D 7/06 (2006.01)
Patent
CA 2381408
A novel anti-etch and cleaning solution is described. The solution comprises a hetero functionalized polymer, caustic and optionally, an anti-etch component and unexpectedly results in glassware that is substantially free of contaminants and etching after washing.
L'invention concerne une nouvelle solution nettoyante et anti-attaque. Ladite solution comprend un polymère à fonctionnalité hétéro, un agent caustique et éventuellement un composant anti-attaque. Elle permet l'obtention de verrerie sensiblement exempte de contaminants et d'attaque après le lavage.
Allen Crawford Charles
Anne Rouillard Carol
Cole David
Howell Michael
Bereskin & Parr Llp/s.e.n.c.r.l.,s.r.l.
Diversey Inc.
Plc Unilever
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