Anti-smudge agent, method of forming an anti-smudge layer,...

C - Chemistry – Metallurgy – 09 – D

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C09D 183/08 (2006.01) B05D 5/08 (2006.01) C09D 5/16 (2006.01) C09K 3/18 (2006.01) G02B 1/10 (2006.01) G02B 1/11 (2006.01) H01J 29/89 (2006.01)

Patent

CA 2260420

An anti-smudge agent containing an organosilicon compound represented by the following general formula (1): R f2-(OC3F6)n2-O-(CF2)m2-(CH2)12-Z-(CH2)s2-Si-(R2)3 ...(1) wherein R f2 is a linear or branched perfluoroalkyl group having 1 to 16 carbon atoms; R2 is a hydrolytic group; Z is -OOCNH- or -O-; n2 is an integer of 1 to 50; m2 is an integer of 0 to 3; 12 is an integer of 0 to 3; and s2 is an integer of 1 to 6, with a proviso that these m2 and 12 meet the condition of 6~m2+12>0.

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