Anti-tricyclo...

Details Anti-tricyclo... Anti-tricyclo...

C - Chemistry, Metallurgy

07

C

260/517.1, 204/9

C07C 51/00 (2006.01) C07C 61/28 (2006.01) C07C 69/74 (2006.01) C08G 63/06 (2006.01)

Patent

CA 1046078

Abstract of the Disclosure Compounds of formula I Image wherein R denotes hydrogen or an aliphatic or aromatic radical and their preparation by irradiation of succinylsuccinic acid or diesters thereof, in the crystalline state, with UV light rays or with .gamma.-radiation.

206433

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