C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/100, 167/187
C07D 519/00 (2006.01) A61K 31/535 (2006.01) A61K 31/545 (2006.01) C07D 277/20 (2006.01) C07D 285/08 (2006.01) C07D 463/00 (2006.01) C07D 471/04 (2006.01) C07D 487/04 (2006.01) C07D 505/00 (2006.01)
Patent
CA 1295995
24205-661 ABSTRACT 1. A compound of the formula; Image wherein R1 is an amino group which may be protected, R3 is a hydrogen atom or an optionally substituted hydrocarbon residue; Z is S, S ? O, O or CH2, R4 is a hydrogen atom, methoxy group or formamido group, R13 is a hydrogen atom, methyl group, hydroxyl group or halogen atom and A? is an optionally substituted imidazolium-1-yl group forming a condensed ring at the 2,3- or 3,4-position or a pharmaceutically acceptable salt or ester thereof is novel and has excellent antibacterial activity.
502935
Fujino Masahiko
Kondo Masahiro
Miyake Akio
Fetherstonhaugh & Co.
Takeda Chemical Industries Ltd.
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