C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/100, 167/187
C07D 519/00 (2006.01) A61K 31/535 (2006.01) A61K 31/545 (2006.01) C07D 463/00 (2006.01) C07D 505/00 (2006.01)
Patent
CA 1277978
ABSTRACT OF THE DISCLOSURE A compound of the general formula: Image wherein R0 is hydrogen, a nitrogen-containing heterocyclic group, an acyl group or an amino-protective group; A is S, S?O, O or CH2; R4 is hydrogen, methoxy group or formamido group; R13 is hydrogen, methyl, hydroxyl or a halogen; and A is an optionally substituted condensed cyclic group formed by combining an imidazole or pyrazole ring with a 5- or 6-membered nitrogen-containing aromatic heterocyclic ring to share a C-N bond with each other, , or a salt or ester thereof, which is antimicrobial , and a process for preparing the same and a pharmaceutical composition thereof are disclosed.
525164
Hashimoto Naoto
Miyake Akio
Nishimura Tatsuo
Yoshimura Yoshinobu
Fetherstonhaugh & Co.
Hashimoto Naoto
Miyake Akio
Nishimura Tatsuo
Takeda Chemical Industries Ltd.
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