C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 501/24 (2006.01) A61K 31/545 (2006.01) C07D 501/00 (2006.01)
Patent
CA 2046442
Abstract This invention relates to novel cephalosporin derivatives of the formula Image (I) wherein R1 is hydrogen, a straight, branched, or cyclic lower alkyl group having up to six carbon atoms or a radical of the formula Image in which R3 and R4 are each independently hydrogen, methyl or ethyl, or R3 and R4, taken together with the carbon atom to which they are attached, may be a cycloalkylidene ring containing from 3 to 5 carbon atoms; R2 is a radical selected from the group consisting of Image , , , Image , wherein R5 is hydrogen or acetyl; R6, R7 and R8 each are independently C1 5 alkyl; n is 1 or 2; and y is 1 to 5. In another aspect, this invention relates to compounds of formula I and their nontoxic pharmaeutically acceptable salts, physiologically hydrolyzable esters or solvates. Representative compounds of this invention were selected for testing and were shown to display potent antibacterial activity.
Iimura Seiji
Imae Kiyoto
Kamachi Hajime
Masuyoshi Shinji
Naito Takayuki
Bristol-Myers Squibb Company
Gowling Lafleur Henderson Llp
LandOfFree
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