C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 417/06 (2006.01) A61K 31/41 (2006.01) A61K 31/4196 (2006.01) A61P 31/10 (2006.01) C07D 249/08 (2006.01) C07D 403/10 (2006.01) C07D 417/14 (2006.01) C07D 513/04 (2006.01)
Patent
CA 2141731
A compound represented by the general formula: (see formula 1) wherein R1 and R2 denote a halogen atom or hydrogen atom; R3 means a hydrogen atom or lower alkyl group; ~ , r and m stand for 0 or 1; A is N or CH; W denotes an aromatic ring or a condensed ring thereof; X means another aromatic ring, an alkanediyl group, an alkenediyl group, or an alkynediyl group; Y stand for -S-, etc.; Z denotes a hydrogen atom, etc., or a salt thereof, and intermediates thereof or a salt thereof as well as processes for the preparation thereof, and pharmacetical composition suitable for use as an antifungal agent.
Hata Katsura
Kaku Yumiko
Naito Toshihiko
Nara Kazumasa
Toyosawa Toshio
Eisai R&d Management Co. Ltd.
Marks & Clerk
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