C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/104.1
C07D 501/36 (2006.01) A61K 31/545 (2006.01) C07D 501/56 (2006.01)
Patent
CA 1152489
ABSTRACT OF THE DISCLOSURE This invention discloses compounds of the general formula (I) Image (I) wherein HO-A- represents a member selected from the group consisting of a hydroxypyridyl group and a hydroxypyridyl group substituted by a lower alkyl group; R1 and R2 each represent a hydrogen atom; T represents a member selected from the group consisting of: Image or Image wherein R3 represents a carboxyl group or a sulfo group; X represents a straight or branched alkylene group; and R4 and R5 may be the same or different, and each represents a lower alkyl group; and its pharmaceutically acceptable non-toxic salts thereof as well as processes for the preparation of these compounds. These cephalosporins are used to make effective antimicrobial compositions.
372303
Jimpo Kiyokazu
Noguchi Hiroshi
Okuda Takao
Tobiki Hisao
Yamada Hirotada
Riches Mckenzie & Herbert Llp
Sumitomo Chemical Co. Ltd.
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