C - Chemistry – Metallurgy – 08 – F
Patent
C - Chemistry, Metallurgy
08
F
6/14, 260/356, 4
C08F 124/00 (2006.01) A01N 25/24 (2006.01) A01N 43/16 (2006.01) C07D 309/10 (2006.01) C07D 309/12 (2006.01) C08F 20/28 (2006.01) C08F 20/58 (2006.01) C08F 24/00 (2006.01) C08L 39/00 (2006.01)
Patent
CA 2003173
ABSTRACT OF THE DISCLOSURE The present invention provides a liquid composition that yields an abrasion resistant polymeric film on a surface that provides extended protection from microbial growth through slow release of a potent antimicrobial agent. The active ingredient of the liquid composition has the following general formula: (I) Image wherein R = H, (C1-C3)alkyl, -COOH, -CH2-COOH, -C6H12, or -phenyl; R' = H, (C1-C3)alkyl, -CH2-COOH, -C6H11, or -phenyl; R" = H, or (C1-C5)alkyl; and X - a single bond; Image or Image where m = 2-4; and z = H or (C1-C3 )alkyl; as well as homopolymers, copolymers, or terpolymers comprising said active ingredient.
Greenwald Richard B.
Sze Isaac S.-Y.
Barrigar & Moss
Ecolab Inc.
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