C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/100, 167/187
C07D 501/00 (2006.01) A61K 31/545 (2006.01) C07D 501/18 (2006.01) C07D 501/26 (2006.01) C07D 501/28 (2006.01) C07D 501/32 (2006.01) C07D 501/34 (2006.01) C07D 501/48 (2006.01) C07D 501/57 (2006.01)
Patent
CA 2001204
NOVEL ANTIMICROBIAL FLUOROQUINOLONYL CEPHEMS Thomas P. Demuth, Jr. Ronald E. White ABSTRACT OF THE DISCLOSURE Antimicrobial fluoroquinolonyl cephems of the formula: Image wherein (1) R1 and R2 are groups among those known in the art for substitution at the 7-position of an antimicrobially-active cephem; (2) R3 is a substituted or unsubstituted, nitrogen-containing, heterocyclic moiety; and (3) R4 is hydrogen, halogen, lower alkoxy or cyclic alkoxy, amino, nitro or cyano. Preferably, R3 is substituted or unsubstituted piperazine, 3-aminopyrrolidine, or 3-aminomethylpyrrolidine. R4 is preferably hydrogen or halogen.
Demuth Thomas P. Jr.
White Ronald E.
Demuth Thomas P. Jr.
Kirby Eades Gale Baker
Procter & Gamble Pharmaceuticals Inc.
White Ronald E.
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