C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 401/06 (2006.01) A61K 31/47 (2006.01) A61K 31/695 (2006.01) C07D 521/00 (2006.01) C07F 7/10 (2006.01)
Patent
CA 2170031
A compound of formula (I) in which R1 and R2 are each hydrogen or lower alkyl, R3 is optionally substituted quinolyl or oxide thereof, and X and Y are each hydrogen, halogen, cyano or lower alkyl, or pharmaceutically acceptable salts thereof, which has antimicrobial acivity.
L'invention concerne un composé de la formule ci-dessous ou l'un de ses sels admis en pharmacie. Ce composé a une action antimicrobienne. Dans cette formule, R<1> et R<2> représentent chacun un hydrogène ou un alkyle inférieur; R<3> représente un quinolyle facultativement substitué ou l'un de ses oxydes; X et Y représentent chacun un hydrogène, un halogène, un cyano ou un alkyle inférieur.
Kawabata Kohji
Nakamura Hideko
Ohki Hidenori
Yamada Akira
Fujisawa Pharmaceutical Co. Ltd.
Swabey Ogilvy Renault
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