C - Chemistry – Metallurgy – 11 – D
Patent
C - Chemistry, Metallurgy
11
D
C11D 1/37 (2006.01) A61K 8/02 (2006.01) A61Q 17/00 (2006.01) C11D 3/00 (2006.01) C11D 3/02 (2006.01) C11D 3/20 (2006.01) C11D 3/37 (2006.01) C11D 3/48 (2006.01) C11D 17/04 (2006.01)
Patent
CA 2291748
The present invention relates to an antimicrobial wipe comprising a porous or absorbent sheet impregnated with an antimicrobial cleansing composition, wherein the antimicrobial cleansing composition comprises from about 0.001 % to about 5.0 % by weight of the antimicrobial cleansing composition, of an antimicrobial active; from about 0.05 % to about 10 % by weight of the antimicrobial cleansing composition, of an anionic surfactant; from about 0.1 % to about 10 % by weight of the antimicrobial cleansing composition, of a proton donating agent; and from about 3 % to about 99,85 % by weight of the antimicrobial cleansing composition, water; wherein the composition is adjusted to a pH of from about 3.0 to about 6Ø The invention also encompasses methods for cleansing skin, reducing the number of germs on the skin, and providing residual effectiveness versus Gram positive and Gram negative bacteria using these products.
L'invention porte sur un chiffon antimicrobien consistant en une feuille poreuse ou absorbante imprégnée d'une composition nettoyante antimicrobienne comportant; d'environ 0,001 % à environ 5,0 % en poids de la composition d'un antimicrobien actif; d'environ 0.05 % à environ 10 % en poids de la composition d'un tensio-actif anionique; d'environ 0,1 % à environ 10 % en poids de la composition d'un donneur de protons; d'environ 3 % à environ 99,85 % en poids de la composition d'eau, le pH de la composition étant compris entre environ 3,0 et environ 6. L'invention porte également sur des procédés de nettoyage de la peau à l'aide dudit produit, réduisant la quantité de germes et procurant une efficacité résiduelle vis-à-vis des bactéries Gram positives et Gram négatives.
Baier Kathleen Grieshop
Bakken Theresa Anne
Beerse Peter William
Evans Marcus Wayne
Morgan Jeffrey Michael
Gowling Lafleur Henderson Llp
The Procter & Gamble Company
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