C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 407/12 (2006.01) C07D 319/20 (2006.01) C07D 405/12 (2006.01) C07D 493/04 (2006.01)
Patent
CA 2071717
A compound of the formula: Image wherein the dotted line represents optional unsaturation; R 1 and R 2 are, independently, hydrogen, alkyl, alkoxy, aralkoxy, alkanoyloxy, hydroxy, halo, amino, mono- or dialkylamino, alkanamido or sulfonamido or R 1 and R 2 together are methylenedioxy, ethylenedioxy or propylenedioxy; R 3 is hydrogen or alkyl; n is one of the integers 2, 3 or 4; X is O or NR 4, in which R 4 is hydrogen or alkyl; or a pharmaceutically acceptable salt thereof, are antipsychotic agents.
Andree Terrance Harold
Scherer Noreen Theresa
Stack Gary Paul
American Home Products Corporation
Ridout & Maybee Llp
Wyeth
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