C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/276, 260/265
C07D 471/04 (2006.01)
Patent
CA 1275100
Abstract of the Disclosure The compounds: Image in which R1 is hydrogen, halogen, hydroxy, or alkyl; R2 is substituted or unsubstituted pyridinyl, pyrazinyl, quinolinyl or quinoxalinyl and said substituents are alkyl, alkoxy, alkoxycarbonyl, halogen, cyano or nitro; R5 and R6 are, independently, hydrogen, alkyl, phenyl, halophenyl, methyl- phenyl, trifluoromethylphenyl, cyanophenyl or nitrophenyl; with the pro- viso that one of R5 and R6 is other than hydrogen; and n is an integer from 1 to 7; or a pharmaceutically acceptable salt thereof, are antipsychotic and anxiolytic agents.
518002
Abou-Gharbia Magid A.
Patel Usha R.
Stein Reinhardt P.
Abou-Gharbia Magid A.
American Home Products Corporation
Marks & Clerk
Patel Usha R.
Stein Reinhardt P.
LandOfFree
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