C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 405/12 (2006.01) A61K 31/47 (2006.01) C07D 493/04 (2006.01)
Patent
CA 2141863
2141863 9405655 PCTABS00030 A compound of formula (1), wherein R1 and R2 are, independently, hydrogen, alkyl, alkoxy, aralkoxy, alkanoyloxy, hydroxy, halo, amino, mono- or dialkylamino, alkanamido or sulfonamido, or R1 and R2 together are methylenedioxy, ethylenedioxy or propylenedioxy; R3 is hydrogen or alkyl; n is one of the integers 2, 3 or 4; or a pharmaceutically acceptable salt thereof, are antipsychotic agents.
Abou-Gharbia Magid Abdel-Megid
Stack Gary Paul
American Home Products Corporation
Ridout & Maybee Llp
LandOfFree
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