C - Chemistry – Metallurgy – 09 – B
Patent
C - Chemistry, Metallurgy
09
B
96/203, 260/240.
C09B 57/00 (2006.01) G03C 1/40 (2006.01) G03F 7/09 (2006.01)
Patent
CA 1274516
ANTIREFLECTION COATINGS AND COMPOUNDS USEFUL THEREFOR Abstract There are disclosed antireflecting compounds and layers used in admixture with or adjacent to a positive-working, non-silver halide photosensitive layer. The compounds have the structural formula: Image wherein R1, R2, R3 and R4 are individually alkyl, thiazole, pyridine or a carbocyclic ring; or together R1 and R2 or R3 and R4 or R1 and R3 or R2 and R4 are the atoms to complete a heterocyclic ring; R5, R6 and R7 are individually H or alkyl; or together R5 and R6 comprise the atoms to complete a ring of from 5 to 6 carbon atoms; n is 0 or 1; and X is an anion. The resulting antireflecting layers have unexpected thermal resistances, needed for the thermal planarization usually given to such photoresists.
510290
Diehl Donald R.
Dominh Thap
Diehl Donald R.
Dominh Thap
Eastman Kodak Company
Gowling Lafleur Henderson Llp
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