G - Physics – 03 – F
Patent
G - Physics
03
F
96/256, 400/7026
G03F 7/00 (2006.01) G03F 7/09 (2006.01) H01L 21/027 (2006.01)
Patent
CA 1274641
ABSTRACT Disclosed are antireflective layers for use in the manufacture of semi-conductor devices, methods and solutions for making such antireflective layers, and the use of such antireflective layers to absorb light in ultraviolet photolithography. The antireflective layers that are utilized comprise a polyphenylquinoxaline.
483703
Cordes William F. III
Jeffries Alfred T. III
Cordes William F. III
Jeffries Alfred T. III
Malcolm Johnston & Associates
Ocg Microelectronic Materials Inc.
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