Antireflective coatings for use in the manufacture of...

G - Physics – 03 – F

Patent

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96/256, 400/7026

G03F 7/00 (2006.01) G03F 7/09 (2006.01) H01L 21/027 (2006.01)

Patent

CA 1274641

ABSTRACT Disclosed are antireflective layers for use in the manufacture of semi-conductor devices, methods and solutions for making such antireflective layers, and the use of such antireflective layers to absorb light in ultraviolet photolithography. The antireflective layers that are utilized comprise a polyphenylquinoxaline.

483703

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