G - Physics – 03 – C
Patent
G - Physics
03
C
96/150
G03C 1/40 (2006.01) G03F 7/031 (2006.01) G03F 7/09 (2006.01)
Patent
CA 1287768
ANTIREFLECTIVE PHOTORESIST COMPOSITION Abstract There is disclosed a photoresist composition in which a dye is added to absorb radiation reflected from the support on which the photoresist is coated. The dye is selected for resistance to volatilization, enhanced developer solubility, and for the wavelengths of absorption. Preferred examples are chalcones.
510293
Diehl Donald R.
Dominh Thap
Diehl Donald R.
Dominh Thap
Eastman Kodak Company
Gowling Lafleur Henderson Llp
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