Antireflective photoresist composition

G - Physics – 03 – C

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

96/150

G03C 1/40 (2006.01) G03F 7/031 (2006.01) G03F 7/09 (2006.01)

Patent

CA 1287768

ANTIREFLECTIVE PHOTORESIST COMPOSITION Abstract There is disclosed a photoresist composition in which a dye is added to absorb radiation reflected from the support on which the photoresist is coated. The dye is selected for resistance to volatilization, enhanced developer solubility, and for the wavelengths of absorption. Preferred examples are chalcones.

510293

LandOfFree

Say what you really think

Search LandOfFree.com for Canadian inventors and patents. Rate them and share your experience with other people.

Rating

Antireflective photoresist composition does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Antireflective photoresist composition, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Antireflective photoresist composition will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFCA-PAI-O-1193425

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.