Antistatic amides

C - Chemistry – Metallurgy – 07 – C

Patent

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8/93.16, 260/557

C07C 233/05 (2006.01) C11D 1/52 (2006.01) C11D 3/32 (2006.01)

Patent

CA 1298314

ANTISTATIC N-HIGHER ALKYL AND ALKENYL NEOALKANOAMIDES, PROCESSES FOR MANUFACTURE THEREOF, ANTISTATIC COMPOSITIONS CONTAINING SUCH AMIDES, AND PROCESSES FOR DECREASING ACCUMULATIONS OF STATIC CHARGES ON LAUNDRY ABSTRACT OF THE DISCLOSURE: N-higher alk(en)yl neoalkanoamides are new compounds which unlike many other amides, are oily at washing temperatures, in the 10 to 90°C. range, and are capable of being adsorbed from wash and rinse waters by fibrous materials, such as laundry of synthetic, e.g., polyester, fabrics, which laundry is sus- ceptible to being electrostatically charged, and decrease any electrostatic charge or inhibit accumulation thereof on such materials. Such neoalkanoamides, e.g., N-coco-alkyl neodecano- amide, can be incorporated in detergent compositions and in compositions for addition to laundry rinse waters, and in some instances it may be desirable for bentonite powder or agglomerate to also be included in such compositions to contribute fabric softening and other useful physical properties. Washing and rinsing operations are described in which N-higher alk(en)yl neoalkanoamide is present in the waters, with and without supplementing small proportions of quaternary ammonium salt. Also described is a process for manufacturing higher alk(en)yl neoalkanoamides in the form of oils which are desirably light in color and of improved purity.

505117

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