Antistatic photographic base, method for preparing it and...

Details Antistatic photographic base, method for preparing it and... Antistatic photographic base, method for preparing it and...

G - Physics

03

C

96/188

G03C 1/89 (2006.01)

Patent

CA 1246381

Antistatic Photographic Base, Method For Preparing It And Photographic Element Comprising Said Base. Abstract Of Disclosure A photographic base is protected against the adverse effects resulting from the accumulation of static electrical charges by providing it with a first antistatic hydrophilic layer and a second protective hydrophobic layer coated onto said first layer, said first layer having been formed by coating onto said base a liquid coating composition comprising a hydrophilic non-diffusing sulfonated polymer in the presence of an epoxy-silane compound. The antistatic base is particularly useful for photographic elements comprising at least one photosensitive image-forming layer, on one side thereof, and the first antistatic layer and the second protective layer on the opposite side thereof. The antistatic layer is durable, abrasion-resistant, non-tacky and can withstand the aqueous photographic processings without adverse effects.

456025

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