Antistatic polyamide compositions, their use and processes...

Details Antistatic polyamide compositions, their use and processes... Antistatic polyamide compositions, their use and processes...

C - Chemistry, Metallurgy

08

K

400/5146, 400/78

C08K 5/16 (2006.01) C07D 295/185 (2006.01) C08G 65/324 (2006.01) C08G 65/333 (2006.01) C08L 77/00 (2006.01) C09K 3/16 (2006.01)

Patent

CA 1053827

ABSTRACT OF THE DISCLOSURE The invention relates to antistatic polyamide compositions compris- ing a polyamide and as an antistatic agent from 0.1 to 20%, preferably from 1.5 to 15%, by weight based on the total weight of the composition of ure- thanes with ether groups, which do not contain free hydroxyl groups and which do not have any hydrogen atoms on the nitrogen atom. These urethanes with ether groups are stable in melts of aliphatic polyamides for prolonged periods at temperatures of up to about 300°C and filaments and fibers of such poly- amides or woven fabrics, knitted fabrics, non-woven or pile fabrics produced from these filaments or fibers show outstanding antistatic properties.

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