C - Chemistry – Metallurgy – 08 – K
Patent
C - Chemistry, Metallurgy
08
K
400/5149
C08K 5/19 (2006.01) C08L 101/00 (2006.01)
Patent
CA 1335013
Disclosed is an antistatic thermoplastic resin composition which comprises a thermoplastic resin and a minor amount of an antistatic property-imparting material which is a polymer comprising 20 to 100 weight % of units of a monomer having a quaternary ammonium base represented by the formula (I): Image (I) wherein R1 represents hydrogen or methyl, R2 through R4 represent hydrogen or (C1-9) alkyl, which may have a substituent, n is a number of 1 to 10, and X- represents a monovalent acid group or a corresponding equivalent of an acid, and up to 80 weight % of units of a copolymerizable vinyl or vinylidene monomer.
545093
Hatakeyama Hiroki
Sasaki Isao
Yamamoto Naoki
Yanagase Akira
Goudreau Gage Dubuc
Mitsubishi Rayon Company Ltd.
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