C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/280, 260/305
C07D 233/90 (2006.01) A01N 53/00 (2006.01) C07D 403/12 (2006.01) C07D 405/12 (2006.01) C07F 7/18 (2006.01)
Patent
CA 1151651
Abstract of the Disclosure There are provided compounds of the formula: Image wherein R is a heteroaroyl group containing a nitrogen, sulfur or oxygen atom which may be substituted with a lower alkyl group, an aralkyl group, an acyl group or a halogen atom; or a cycloalkanoyl group which may be substituted with a lower alkyl group, a lower alkenyl group, a halogen atom, a halogeno-lower alkenyl group, a phenyl group, a halogeno- phenyl group, a lower alkoxyphenyl group, a lower alkylphenyl group, a formyl group, a hydroxy group, an amino group, 2 carboxyl group, an amino methyl group or an oxo group, its non toxic salt and a process for producing them. Useful as antitumor agents and immunosuppressants.
357556
Atsumi Toshio
Kiyohara Takao
Sanjiki Tetsutaro
Ridout & Maybee Llp
Sumitomo Chemical Co. Ltd.
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