C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/235.95
C07D 233/90 (2006.01)
Patent
CA 1140544
Abstract of the Disclosure There are provided compounds of the formula: Image wherein R is an adamantoyl group substituted with a lower alkyl group, a lower alkoxy group, a hydroxy group, a lower alkanoyloxy group, an benzyloxy group, a halogen atom, an acetamido group, a nitro group, an azide group, a trifluoro- methyl group or a phenyl group which may be substituted with a nitro group, a halogen atom, a lower alkyl group or a lower alkoxy group and a process producing them. Useful as antitumor agents and immunosuppressants.
363814
Atsumi Toshio
Kiyohara Takao
Takebayashi Yoshiaki
Ridout & Maybee Llp
Sumitomo Chemical Company Limited
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