C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
167/202, 167/220
C07D 473/34 (2006.01) C07D 473/18 (2006.01) C07D 473/30 (2006.01)
Patent
CA 1278517
Abstract of the Disclosure A compound of the formula: Image wherein R is a hydroxyl group which may be protected and Y is a purine base which may be protected, and the salts threof; which is useful as an antiviral agent.
531191
Hamana Takumi
Marumoto Ryuji
Taniyama Yoshio
Yamamoto Naoki
Fetherstonhaugh & Co.
Hamana Takumi
Marumoto Ryuji
Takeda Chemical Industries Ltd.
Taniyama Yoshio
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