Aperture cleaning system

Details Aperture cleaning system Aperture cleaning system

H - Electricity

05

B

309/25

H05B 3/60 (2006.01)

Patent

CA 1163294

ABSTRACT A cleaning system for clearing residue left within the internal surfaces of the apertures of a particle study device in which particles In suspension are passed through one or more microscopic apertures to generate particle related signals for study of the particles in the suspension by applying thereto energy through the apertures sufficient to boil the fluid therein. The energy is applied in the form of a D.C. current at a relatively high constant magnitude level for a relatively short continuous predetermined length of time, generally between passages of the particle suspensions. The energy applied preferably is greater than two tenths watt seconds.

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