Apparatus and method for cleaning a sawn wafer block

Details Apparatus and method for cleaning a sawn wafer block Apparatus and method for cleaning a sawn wafer block

B - Operations, Transporting

08

B

B08B 3/04 (2006.01) B28D 5/00 (2006.01)

Patent

CA 2632387

An apparatus for cleaning a sawn wafer block (40) has a cleaning basin (10), a holder (50, 52) for holding a sawn wafer block (40) in the cleaning basin (10) in such a way that, when there is a cleaning fluid (34) in the cleaning basin (10), at least one portion of the wafer block (40) that has sawn gaps is arranged in the cleaning fluid, at least one outlet opening (18) in a bottom region (16) of the cleaning basin (10) and a closure device (20, 22) for the outlet opening (18), by which the outlet opening (18) can be opened and closed. The closure device (20, 22), the outlet opening (18) and the bottom region of the cleaning basin are designed in such a way that, by opening the closure device (20, 22), the cleaning fluid can be emptied so quickly from at least the region of the cleaning basin (10) in which the wafer block is arranged that contaminants can be removed from the sawn gaps by the suction effect of the cleaning fluid.

L'invention concerne un dispositif de nettoyage d'un bloc scié (40) de galettes semi-conductrices, qui présente une cuve de nettoyage (10), un support (50, 52) qui maintient un bloc scié (40) de galettes semi-conductrices dans la cuve de nettoyage (17) de sorte que lorsqu'un liquide de nettoyage (34) est présent dans la cuve de nettoyage (10), au moins une partie du bloc (40) de galettes semi-conductrices qui présente des interstices de sciage soit disposée dans le liquide de nettoyage, au moins une ouverture de sortie (18) située dans la zone du fond (16) de la cuve de nettoyage (10) et un dispositif de fermeture (20, 22) de l'ouverture de sortie (18) qui permet d'ouvrir et de fermer l'ouverture de sortie (18). Le dispositif de fermeture (20, 22), l'ouverture de sortie (18) et la zone du fond de la cuve de nettoyage sont conçus de telle sorte que l'ouverture du dispositif de fermeture (20, 22) permet d'évacuer le liquide de nettoyage au moins de la partie de la cuve de nettoyage (10) dans laquelle le bloc de galettes semi-conductrices est disposé, et ce suffisamment rapidement pour pouvoir éliminer les impuretés hors des interstices de sciage par un effet d'aspiration du liquide de nettoyage.

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