Apparatus and method for coating objects through pvd

C - Chemistry – Metallurgy – 23 – C

Patent

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Details

C23C 14/56 (2006.01) B65G 17/00 (2006.01) B65G 35/06 (2006.01) B65G 47/244 (2006.01) C23C 14/02 (2006.01) C23C 14/50 (2006.01) C23C 14/58 (2006.01)

Patent

CA 2350492

The invention relates to an apparatus (1) for applying at least one coating to objects by means of vapour deposition (PVD) under vacuum, comprising: a preprocessing device (3) for performing a preprocessing on the object; a PVD device (2) for coating an object under a vacuum; and a postprocessing device (4) for postprocessing the objects, wherein: the apparatus comprises a transport device (5) which extends through the preprocessing device, the PVD device and the postprocessing device, the transport device is adapted to transport objects arranged on carriers, and the PVD device is adapted for semi- continuous treatment of objects arranged on the carriers.

L'invention concerne un appareil (1) qui permet d'appliquer au moins un revêtement sur un objet, par métallisation par évaporation sous vide (PVD). L'appareil comprend un dispositif de prétraitement (3) pour effectuer un prétraitement sur l'objet; un dispositif de dépôt par évaporation sous vide (2) pour appliquer sur l'objet un revêtement sous vide; et un dispositif de post-traitement (4) pour réaliser un post-traitement sur l'objet. L'appareil comprend également un dispositif de transport (5) qui s'étend à travers le dispositif de prétraitement, le dispositif de dépôt par évaporation sous vide et le dispositif de post-traitement. Le dispositif de transport est conçu pour transporter des objets disposés sur des supports, et le dispositif de dépôt par évaporation sous vide est conçu pour traiter en semi-continu des objets disposés sur les supports.

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