C - Chemistry – Metallurgy – 23 – C
Patent
C - Chemistry, Metallurgy
23
C
C23C 14/50 (2006.01) C23C 14/04 (2006.01) C23C 14/30 (2006.01) C23C 14/54 (2006.01)
Patent
CA 2354925
Apparatus (10) for treating a substrate, comprising: a vacuum chamber (12); a substrate carrier (14) adapted to carry a substrate (16) to be treated; a source material holder (22) for holding a source material (34) with which the substrate (16) is to be treated; and vaporising or sputtering means (20) for vaporising/sputtering the source material (34); wherein the source material holder (22) includes a positioning means (24) for relatively moving the source material (34) towards the substrate carrier (14).
Rtc Systems Ltd.
Satis Vacuum Industries Vertriebs Ag
Sim & Mcburney
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