C - Chemistry – Metallurgy – 23 – C
Patent
C - Chemistry, Metallurgy
23
C
C23C 16/00 (2006.01) B01B 1/00 (2006.01) B01F 3/02 (2006.01) C23C 16/40 (2006.01) C23C 16/44 (2006.01) C23C 16/448 (2006.01) C23F 15/00 (2006.01) F01B 31/00 (2006.01) H01L 39/24 (2006.01)
Patent
CA 2158434
A process system comprising a liquid reagent vaporization and supply apparatus (300) including a vaporization chamber housing (302) having a porous vaporization element (340) therein in proximity to the housing interior wall surface (320) to define liquid flow channels (332, 324, 326, 328). A pump assembly (10) may be used in such system to pump air- or moisture-sensitive liquids, in which the wetted parts of the pump are blanketed with an inert medium and/or the process liquid with a low vapor pressure liquid component effective for inhibiting corrosion or particulate formation. In another aspect, the invention relates to a means and method for protecting a source reagent vaporizer (17) from the harmful effects of solid build-up occurring during its use in chemical vapor deposition (CVD), due to premature decomposition of the source reagent on the vaporizer element and oxidative decomposition of the source reagent to produce solid products which cause clogging and inefficient vaporization, by periodically flush cleaning such vaporizer element to increase its consistency, reliability, and service life.
Gardiner Robin A.
Kirlin Peter S.
Van Buskirk Peter
Advanced Technology Materials Inc.
Kirby Eades Gale Baker
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