C - Chemistry – Metallurgy – 23 – C
Patent
C - Chemistry, Metallurgy
23
C
117/85
C23C 16/22 (2006.01) C04B 41/50 (2006.01) C23C 16/40 (2006.01) C23C 16/455 (2006.01) C23C 16/52 (2006.01) H01M 8/12 (2006.01)
Patent
CA 1241876
13 ABSTRACT OF THE DISCLOSURE Disclosed is an apparatus for forming a chemical- ly vapor deposited coating on a porous substrate where oxygen from a first gaseous reactant containing a source of oxygen permeates through the pores of the substrate to react with a second gaseous reactant that is present on the other side of the substrate. The apparatus includes means for controlling the pressure and flow rate of each gaseous reactant, a manometer for measuring the difference in pressure between the gaseous reactants on each side of the substrate, and means for changing the difference in pres- sure between the gaseous reactants. Also disclosed is a method of detecting and closing cracks in the coating by reducing the pressure difference between the two gaseous reactants whenever the pressure difference falls suddenly after gradually rising, then again increasing the pressure difference on the two gases. The attack by the by-products of the reaction on the substrate are reduced by maintaining the flow rate of the first reactant through the pores of the substrate.
488667
Isenberg Arnold O.
Zymboly Gregory E.
Oldham And Company
Westinghouse Electric Corporation
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