H - Electricity – 01 – L
Patent
H - Electricity
01
L
H01L 39/00 (2006.01) C23C 14/08 (2006.01) C23C 14/28 (2006.01) C23C 14/56 (2006.01) H01L 39/24 (2006.01) H01P 11/00 (2006.01)
Patent
CA 2171125
An apparatus and a method are provided for depositing both surfaces of the substrate in one deposition process via on-agis oriented laser ablation. For example, the first apparatus for depositing thin films according to the present invention comprises (1) a vacuum chamber, said chamber having (a) a first target supported by a first target holder, (b) a second target supported by a second target holder so as to face the first target, (c) a substrate holder for holding a substrate such that first and second surfaces of the substrate face the first and second targets, respectively, (d) a heating means for heating the substrate, (e) a first entrance window through which a first laser beam passes and strikes on the first target with a predetermined angle, and (f) a second entrance window through which a second laser beam passes and strikes on the second target with a predetermined angle and (2) a laser optical system comprising at least one laser beam source and optical path system including mirror for reflecting the laser beam from the laser beam source into the first and second targets respectively with the predetermined angles through the first and second entrance windows of the chamber.
Itozaki Hideo
Nagaishi Tatsuoki
Marks & Clerk
Sumitomo Electric Industries Ltd.
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