Apparatus and method for injecting compounds in plasma for...

Details Apparatus and method for injecting compounds in plasma for... Apparatus and method for injecting compounds in plasma for...

G - Physics

01

N

73/55

G01N 21/73 (2006.01) G01N 21/71 (2006.01)

Patent

CA 2036988

A sample of liquid or organometallic compound is analyzed far detection and measurement of metal impurities by inductively coupled argon plasma optical emission spectroscopy (ICAP-OES). The liquid sample is continuously injected into and evaporated in a heated stream of argon as the stream flows continuously to the plasma. In the plasma, metal impurities in the sample emit characteristic radiation which is measured by the spectrometer.

Affiliated with

Also associated with

Rating

Apparatus and method for injecting compounds in plasma for... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus and method for injecting compounds in plasma for..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus and method for injecting compounds in plasma for... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFCA-PAI-O-1989682