G - Physics – 03 – F
Patent
G - Physics
03
F
204/109, 204/91.
G03F 7/36 (2006.01) C08J 3/28 (2006.01) C08J 7/18 (2006.01)
Patent
CA 1337482
Polyimides, polycarbonates, polyetherimides and other highly stable organic polymers are photoetched through the use of deep ultraviolet light produced by a broad area, non-coherent, continuous light source. This method is effective in an oxygen-free environment, but provides slightly higher etch rates in an air ambient as a result of the oxygen in the air ambient. The apparatus in which this photoetching occurs may employ a single light source or a plurality of side-by-side lamps and may include ports which allow continuous transport of samples therethrough.
599446
Grubb Willard Thomas
Liu Yung Sheng
Company General Electric
Craig Wilson And Company
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