Apparatus and method for providing electron beam patterns...

Details Apparatus and method for providing electron beam patterns... Apparatus and method for providing electron beam patterns...

H - Electricity

01

J

355/6

H01J 29/70 (2006.01) G09G 1/20 (2006.01) H01J 29/98 (2006.01) H01J 31/12 (2006.01)

Patent

CA 1150415

APPARATUS AND METHOD FOR PROVIDING ELECTRON BEAM PATTERNS USING EXPANDED BEAM ARRAY Abstract of the Disclosure An apparatus and method for forming scanned electron beam patterns which finds particular use in multiple beam cathode ray tubes. Instead of using the vertical line array of electron beam sources which is used in conven- tional multiple beam tubes, a two dimensional expanded beam array is provided. The expanded array is such that no two electron beams in the array are disposed in the same scan line and it is of a geometric shape having comparable length and width dimensions. In order to form characters or other patterns logic circuitry is provided to control each beam of the expanded array at respective scanning positions as the array is deflected or scanned across the screen of the cathode ray tube. Y0978-070

363900

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