Apparatus and method for reducing charge accumulation on a...

H - Electricity – 01 – J

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H01J 37/02 (2006.01) H01J 1/30 (2006.01)

Patent

CA 2336369

A system for reducing surface charge on a target surface in charged particle beam lithography or microscopy, using an apparatus including: a beam column that outputs a charged particle beam towards the surface; and a charge reducing device positioned between the surface and the beam column, where the charge reducing device emits charged particles to neutralize charge on the surface. The charge reducing device can include a MOS device and a voltage source, where the voltage source is coupled to provide a voltage across the MOS device to cause the MOS device to emit the charged particles. The charge reducing device can include multiple MOS devices mounted on a mechanical mount and a voltage source, where the voltage source is coupled to provide a voltage across the MOS devices to cause the MOS devices to emit the charged particles. The associated method for reducing surface charge on a surface includes outputting the charged particle beam towards the target surface and emitting charged particles to neutralize the resulting charge on the surface.

L'invention concerne un système permettant de réduire une charge de surface cible en lithographie ou microscopie à faisceau de particules chargées. On utilise pour cela un dispositif comprenant: une colonne de faisceau produisant un faisceau de particules chargées en direction de la surface; et un dispositif de réduction de charge placé entre la surface et la colonne de faisceau, ce dispositif émettant des particules chargées pour neutraliser la charge sur la surface. Le dispositif réducteur en question peut comprendre un dispositif MOS et une source de tension, laquelle est couplée en vue de fournir une tension aux bornes du dispositif MOS pour l'émission des particules chargées via ce dispositif MOS. Le dispositif réducteur peut comporter plusieurs dispositifs MOS montés sur une structure mécanique et une source de tension, laquelle est couplée en vue de fournir une tension aux bornes des dispositifs MOS pour l'émission des particules chargées via ces dispositifs MOS. L'invention concerne en outre un procédé permettant de réduire une charge de surface, qui consiste à produire un faisceau de particules chargées en direction de la surface cible et à émettre des particules chargées afin de neutraliser la charge résultante sur la surface.

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