C - Chemistry – Metallurgy – 23 – C
Patent
C - Chemistry, Metallurgy
23
C
117/64, 32/84
C23C 14/04 (2006.01) B05B 15/04 (2006.01) B05C 17/06 (2006.01) B05D 1/32 (2006.01) C23C 16/04 (2006.01) H01L 21/68 (2006.01)
Patent
CA 1283281
APPARATUS AND METHOD FOR REGISTRATION OF SHADOW MASKED THIN-FILM PATTERNS ABSTRACT An apparatus and method for registration or alignment of thin film structure patterns on a substrate formed with the use of an apertured mask in a vacuum deposition system. On particular the alignment apparatus is comprises of a mask holder assembly, which supports the apertured mask, and a substrate carrier which engages with the holder assembly. Upon placing the engaged alignment apparatus in a deposition chamber. a magnet is positioned adjacent the holder assembly in order to firmly hold the apertured mask against a substrate prior to vacuum to deposition. Upon depositing the pattern material. the magnet and holder assembly are disengaged, resulting in a pattern of thin film structures remaining on the substrate. The present invention is effective for remotely operating automatic masking systems where there is a need to eliminate the need for breaking vacuum in a deposition system.
519971
Boudreau Robert A.
Wilkie Robert J.
Boudreau Robert A.
Gte Products Corporation
R. William Wray & Associates
Wilkie Robert J.
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