C - Chemistry – Metallurgy – 23 – C
Patent
C - Chemistry, Metallurgy
23
C
C23C 16/04 (2006.01) C23C 16/27 (2006.01) C23C 16/511 (2006.01) C30B 29/04 (2006.01) H01J 37/32 (2006.01)
Patent
CA 2182247
A radiofrequency wave apparatus and method which provides a relatively high concentration of reactive species from a plasma for the treatment of a surface particularly of a substrate (31) with a complex geometry in a holder (62) which masks a portion of the substrate. The radiofrequency waves are preferably microwaves or UHF waves. The apparatus and method is particularly useful for rapid plasma assisted chemical vapor deposition of diamond on a portion of the substrate, particularly on surfaces of objects with complex geometries such as a drill (60) or a seal ring (64).
L'invention est constituée par un appareil et une méthode à ondes radiofréquence servant à produire, à partir d'un plasma, une concentration relativement élevée d'une substance réactive pour le traitement d'une surface, particulièrement la surface d'un substrat (31) à géométrie complexe dans un support (62) qui masque une partie dudit substrat. Dans ses concrétisations privilégiées, l'invention utilise des micro-ondes ou des ondes UHF. L'appareil et la méthode de l'invention sont particulièrement utiles pour déposer rapidement du diamant en phase vapeur sur une partie du substrat, particulièrement sur les surfaces d'objets à géométrie complexe tels que les mèches (60) ou les bagues d'étanchéité (64).
Asmussen Jes
Zhang Jie
Board Of Trustees A. Constitutional Corporation Operating Michigan State Universit
Macrae & Co.
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