Apparatus and methods for forming and use with variable pit...

Details Apparatus and methods for forming and use with variable pit... Apparatus and methods for forming and use with variable pit...

G - Physics

11

B

G11B 7/007 (2006.01) G11B 7/005 (2006.01) G11B 7/26 (2006.01) G11B 20/10 (2006.01) G11B 20/14 (2006.01) G11B 27/10 (2006.01) G11B 27/30 (2006.01) G11B 27/36 (2006.01)

Patent

CA 2249403

An apparatus (figure 2) and method for forming a digital optical disc master from a disc having a substrate (300) coated with a photoresist coating (320). The method includes irradiating the surface of the photoresist material (320) with a laser beam (310) at a multiplicity of pit locations over the substrate (300) causing the photoresist material (320) to react to the laser radiation (310) to form at least three different discrete levels at the multiplicity of pit locations relative to the surface of the substrate (300) due to the dose of radiation applied being calculated to react with the photoresist to a depth equivalent to the discrete levels. The exposed photoresist is then developed to achieve the pits having the different discrete levels. A further method is disclosed for equalization and compensation for intersymbol interference between adjacent pits.

Dispositif et procédé de création d'un disque matrice optique numérique possédant un substrat (300) recouvert d'un revêtement de résine photosensible (320). Ce procédé consiste à irradier la surface du revêtement (320) au moyen d'un faisceau laser (310) au niveau d'une multiplicité d'emplacements de puits au-dessus du substrat (300), ce qui amène le matériau photosensible (320) à réagir avec le rayonnement laser (310) de manière à créer au moins trois niveaux discrets différents au niveau de la multiplicité d'emplacements de puits par rapport à la surface du substrat (300), dans la mesure où le dosage du rayonnement appliqué est calculé pour réagir avec le matériau photosensible à une profondeur équivalente aux niveaux discrets. La résine photosensible exposée est ensuite développée afin de réaliser les puits possédant les différents niveaux discrets. Un autre procédé permet d'effectuer l'uniformisation et la régularisation des interférences entre symboles entre les puits contigus.

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