Apparatus and process for surface treatment of substrate...

C - Chemistry – Metallurgy – 23 – C

Patent

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Details

C23C 16/452 (2006.01) C03C 17/00 (2006.01) C23C 16/455 (2006.01) H01J 37/32 (2006.01)

Patent

CA 2580814

An apparatus and process for treating at least a portion of the surface of a substrate is described herein. In one aspect, the apparatus a processing chamber comprising an inner volume, the substrate, and an exhaust manifold; an activated reactive gas supply source wherein a process gas comprising one or more reactive gases and optionally an additive gas is activated by one or more energy sources to provide the activated reactive gas; and a distribution conduit, which is in fluid communication with the inner volume and the supply source, comprising: a plurality of openings that direct the activated reactive gas into the inner volume, wherein the activated reactive gas contacts the surface and provides a spent activated reactive gas and/or volatile products that are withdrawn from the inner volume through the exhaust manifold.

L'invention concerne un appareil et un procédé de traitement d'au moins une partie de la surface d'un substrat. Dans un mode de réalisation, l'appareil comprend une chambre de traitement présentant un volume interne, le substrat et un collecteur d'échappement; une source d'alimentation de gaz réactif activé, un gaz de procédé comprenant un ou plusieurs gaz réactifs et éventuellement un gaz additif étant activé par une ou plusieurs sources d'énergie afin de fournir le gaz réactif activé; et un conduit de distribution, en communication fluidique avec le volume interne et la source d'alimentation, comprenant: une pluralité d'ouvertures dirigeant le gaz réactif activé dans le volume interne, le gaz réactif activé venant en contact avec la surface et fournissant un gaz réactif activé éteint et/ou des produits volatils retirés du volume interne via le collecteur d'échappement.

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