G - Physics – 02 – F
Patent
G - Physics
02
F
345/11
G02F 1/35 (2006.01) G02F 1/21 (2006.01) G02F 1/225 (2006.01) G02F 3/02 (2006.01)
Patent
CA 1293794
APPARATUS COMPRISING A MONOLITHIC NONLINEAR FABRY-PEROT ETALON, AND METHOD FOR PRODUCING SAME Abstract The inventive method for forming monolithic nonlinear Fabry-Perot etalons comprises depositing on an appropriate substrate, e.g., a GaAs wafer, a first multilayer mirror, depositing on the first mirror a spacer typically comprising optically nonlinear material, and depositing a second multilayer mirror onto the spacer. Typically, at least one of the mirrors is an active mirror comprising optically nonlinear material. Deposition can be by a known process, e.g., by MBE or MOCVD. Since, inter alia, the method comprises no critical etching steps it can be used to produce high finesse etalons that have uniform properties over relatively large areas. The inventive method can be adapted to the manufacture of transmissive etalons. It can also be used to produce arrays of optically isolated etalons. Devices comprising nonlinear etalons manufacturedby the inventive method can be incorporated, for instance, into optical data processing apparatus, or into optical communications apparatus.
538778
Jewell Jack Lee
Mccall Samuel Laverte Jr.
American Telephone And Telegraph Company
Kirby Eades Gale Baker
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