C - Chemistry – Metallurgy – 23 – C
Patent
C - Chemistry, Metallurgy
23
C
C23C 16/00 (2006.01) C23C 16/509 (2006.01) H01J 37/32 (2006.01)
Patent
CA 2214921
The invention relates to an apparatus for use in a Plasma Enhanced Chemical Vapor Deposition (PECVD) process whereby a coating of inorganic material is deposited on three-dimensional articles, including low melting temperature polymer articles. The coating possesses excellent gas and/or water vapor barrier properties.
L'invention porte sur un appareil destiné au procédé de dépôt chimique en phase vapeur activé par plasma (PECVD), permettant d'appliquer un revêtement de matière minérale sur des articles tri-dimensionnels, incluant des articles en polymères à bas point de fusion. L'effet barrière du revêtement pour les gaz et (ou) la vapeur d'eau est extrêmement efficace.
Becton Dickinson And Company
Gowling Lafleur Henderson Llp
LandOfFree
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