H - Electricity – 01 – L
Patent
H - Electricity
01
L
356/122, 356/187
H01L 21/00 (2006.01) G03F 7/26 (2006.01)
Patent
CA 1286794
APPARATUS FOR DRY PROCESSING A SEMICONDUCTOR WAFER Abstract of the Disclosure A method and apparatus of dry processing a semiconductor wafer including processes of vacuum baking and dry silylation provides a gaseous atmosphere of pressure up to 760 Torr against the surface of the wafer, one or more of the constituents of the gas being obtained from a liquid fluid source of the constituent, including a metering device that controls flow of the liquid fluid from a remote reservoir and feeds it to a vaporizer that converts the fluid to a vapor gas at pressure up to 760 Torr and feeds the vapor gas at that pressure into a wafer processing chamber where the particular dry process involving the vapor gas is carried out on the wafer surface. In a preferred embodiment the metering device is an automotive fuel injector, sometimes referred to as a throttle body injector (TBI) that is energized by electrical pulses, each electrical pulse causing the TBI to inject a given predetermined amount into the vaporizer which heats the fluid, turning it into a vapor gas at pressure up to 760 Torr.
561382
Monarch Technologies Corporation
Palmer David W.
Riches Mckenzie & Herbert Llp
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