H - Electricity – 01 – L
Patent
H - Electricity
01
L
356/142, 356/177
H01L 47/00 (2006.01) H01J 37/21 (2006.01) H01J 37/304 (2006.01)
Patent
CA 1103813
ABSTRACT OF THE DISCLOSURE This invention relates to apparatus for electron beam lithography capable of the automatic focusing of a shaped electron beam. An electron beam is uniformly projected onto a reference aperture plate having an opening of any desired shape, and the thus obtained beam in the shape of the opening is reduced and projected onto a specimen to perform a process- ing operation in a microscopic pattern on the specimen. An electron beam-deflecting device periodically changes the direction of the beam, such device being disposed between an electron gun emitting the beam and the reference aperture plate. Deviation of the position of the final-image beam corresponding to the angle of deflection of the beam due to the beam-deflecting device is detected, and the focal length of a final-stage electron lens correspondingly adjusted to minimize the positional deviation. The result is effective focusing of the projected beam.
316633
Hitachi Ltd.
Kirby Eades Gale Baker
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