Apparatus for electrostatically depositing and retaining...

B - Operations – Transporting – 05 – B

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B05B 5/00 (2006.01) A61M 15/00 (2006.01) B05B 5/08 (2006.01) B05B 15/04 (2006.01) B41J 2/41 (2006.01) B41J 2/415 (2006.01) G03G 15/20 (2006.01) G03G 17/00 (2006.01) A61M 15/02 (2006.01)

Patent

CA 2223168

A substrate (104) having a planar conductive plating (106) located on a first surface of a dielectric layer (108) and having a conductive collection trace (110) on a second surface of the dielectric layer (108) such that the conductive plating (106) and collection trace (110) have a parallel, spaced apart relation. The collection trace (110) is charged by supplying a voltage to the plating (106) and the trace (110) to establish a voltage differential across the dielectric layer (108). The material to be deposited (116) is charged to a polarity opposite that of the trace (110) so that the deposited material (102) is electrostatically retained.

L'invention concerne un substrat (104) présentant un placage conducteur plan (106) situé sur une première surface d'une couche de diélectrique (108) et présentant un ruban collecteur conducteur (110) sur une seconde surface de ladite couche de diélectrique (108) de sorte que le placage conducteur (106) et le ruban collecteur (110) soient placés parallèlement l'un par rapport à l'autre selon un certain espacement. Une tension est envoyée au placage (106) et au ruban (110) de sorte que ce dernier (110) soit chargé et qu'un différentiel de tension soit créé au travers de la couche de diélectrique (108). Le matériau à déposer (16) est chargé à une polarité opposée à celle du ruban (110) de sorte que la matière déposée (102) soit retenue de manière électrostatique.

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