Apparatus for forming thin film

C - Chemistry – Metallurgy – 23 – C

Patent

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C23C 14/32 (2006.01) C23C 14/22 (2006.01) C23C 14/56 (2006.01)

Patent

CA 2034243

ABSTRACT OF THE DISCLOSURE An apparatus for forming a thin film includes a vacuum chamber; an exhaust system for evacuating the air in the vacuum chamber so as to render the vacuum chamber a vacuum; and a crucible for generating, in the vacuum chamber, clusters of a deposit substance. The apparatus for forming a thin film further includes an ionizing device for ionizing part of the clusters generated by the crucible; an acceleration device for accelerating both clusters ionized by the ionizing device and clusters not yet ionized to allow both types of clusters to collide with a substrate retained in the vacuum chamber; and a filter for removing a cluster which is smaller than a predetermined size, this cluster being ionized by the ionizing device.

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