Apparatus for imaging a mask pattern on a substrate

Details Apparatus for imaging a mask pattern on a substrate Apparatus for imaging a mask pattern on a substrate

G - Physics

03

F

356/192

G03F 9/00 (2006.01)

Patent

CA 1232981

PHN. 11.053 15 ABSTRACT: A pre-alignment system of an apparatus for imaging a mask pattern on a substrate is described. The pre-alignment system com- prises two optical imaging systems for imaging two alignment marks provided on the substrate for the purpose of fine-alignment onto two radiation-sensitive detectors, the combined output signals of the subdetectors of each detector being a measure of the alignment of the associated alignment mark relative to a detector. me align- ment marks are preferably phase gratings and the imaging systems are preferably interference-contrast microscopes.

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